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A Novel Single-Component Negative Resist for DUV and Electron Beam Lithography

✍ Scribed by H. Wu; K. E. Gonsalves

Publisher: John Wiley and Sons
Year: 2001
Tongue: English
Weight: 197 KB
Volume: 13
Category: Article
ISSN: 0935-9648
DOI: 10.1002/1521-4095(200102)13:3<195::aid-adma195>3.0.co;2-a

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