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A new nanocomposite resist for low and high voltage electron beam lithography

✍ Scribed by M. Azam Ali; Kenneth E. Gonsalves; Ankur Agrawal; Augustin Jeyakumar; Clifford L. Henderson

Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
481 KB
Volume
70
Category
Article
ISSN
0167-9317

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✦ Synopsis

A novel nanocomposite photoresist was synthesized and characterized for use in both low and high voltage electron beam lithography. This resist system is shown to display the ideal combination of both enhanced etch resistance and enhanced sensitivity required to satisfy both low and high voltage patterning applications. Resist sensitivity was enhanced by the direct incorporation of a photoacid generating monomer into the resist polymer backbone while the etch resistance of the material was improved by copolymerization with a POSS containing monomer.

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