Using an atomic force microscope (AFM) operating in air, we locally modify thin films of ebeam-deposited Cr and Ti by applying voltage pulses between the AFM tip and the sample, which is positively biased with respect to the tip. The modifications consist in anodization and/or mechanical deformation
A New Scanning Probe Lithography Scheme with a Novel Metal Resist
โ Scribed by M. Rolandi; C.F. Quate; H. Dai
- Publisher
- John Wiley and Sons
- Year
- 2002
- Tongue
- English
- Weight
- 276 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0935-9648
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
Scanning probe microscopy is opening new applications in magnetic engineering due to superior resolution limits without any sample preparation under ambient conditions. In this paper we report time-resolved magnetic stray รeld measurements based on a new type of probe to characterize magnetic รelds.
SEM linewidth measurement in the process latitude investigation procedure can be replaced with a resist reflow technique for PMMA and other positive resists. The linewidth dependence on technical parameters can be measured quickly and cheaply with specialised test structures.