๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

A New Scanning Probe Lithography Scheme with a Novel Metal Resist

โœ Scribed by M. Rolandi; C.F. Quate; H. Dai


Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
276 KB
Volume
14
Category
Article
ISSN
0935-9648

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Nanolithographic patterning of thin meta
โœ S. Melinte; B. Nysten; V. Bayot ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 209 KB

Using an atomic force microscope (AFM) operating in air, we locally modify thin films of ebeam-deposited Cr and Ti by applying voltage pulses between the AFM tip and the sample, which is positively biased with respect to the tip. The modifications consist in anodization and/or mechanical deformation

A Novel Method for Time-resolved Charact
โœ Bangert, J.; Kasim, S.; Mertin, W.; Kubalek, E. ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 420 KB ๐Ÿ‘ 1 views

Scanning probe microscopy is opening new applications in magnetic engineering due to superior resolution limits without any sample preparation under ambient conditions. In this paper we report time-resolved magnetic stray รeld measurements based on a new type of probe to characterize magnetic รelds.

A simple new method for the investigatio
โœ V.A. Kudryashov; P.D. Prewett; A.G. Michette ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 704 KB

SEM linewidth measurement in the process latitude investigation procedure can be replaced with a resist reflow technique for PMMA and other positive resists. The linewidth dependence on technical parameters can be measured quickly and cheaply with specialised test structures.