✦ LIBER ✦

A simple new method for the investigation of process latitude in E-beam lithography with positive resists

✍ Scribed by V.A. Kudryashov; P.D. Prewett; A.G. Michette

Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 704 KB
Volume: 53
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(00)00327-0

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✦ Synopsis

SEM linewidth measurement in the process latitude investigation procedure can be replaced with a resist reflow technique for PMMA and other positive resists. The linewidth dependence on technical parameters can be measured quickly and cheaply with specialised test structures.

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