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A new masking method for protecting silicon surfaces during anisotropic silicon wet etching

✍ Scribed by P. Normand; K. Beltsios; A. Tserepi; K. Aidinis; D. Tsoukalas; C. Cardinaud

Book ID: 114155439
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 658 KB
Volume: 61-62
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00510-5

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