A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of silicon

✍ Scribed by Dalvi-Malhotra, J; Zhong, X F; Planje, C; Brand, G; Yess, K

• Book ID: 111870646
• Publisher: Institute of Physics
• Year: 2008
• Tongue: English
• Weight: 597 KB
• Volume: 18
• Category: Article
• ISSN: 0960-1317
• DOI: 10.1088/0960-1317/18/2/025029