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Selective area deposition of a-C:H films as masks for anisotropic etching of crystalline silicon in aqueous potassium hydroxide

✍ Scribed by Alfeu Fissore; Marco AR Alves; Edmundo da Silva Braga; Lucila Cescato


Book ID
108390379
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
276 KB
Volume
49
Category
Article
ISSN
0042-207X

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