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Oxygen implantation through patterned masks: a method for forming insulated silicon device islands while maintaining a planar wafer surface

✍ Scribed by U. Bussmann; P.L.F. Hemment; A.K. Robinson; V.V. Starkov


Book ID
113282494
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
719 KB
Volume
55
Category
Article
ISSN
0168-583X

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