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A nano-scale alignment method for imprint lithography

✍ Scribed by Wang, Li ;Lu, Bing-heng ;Ding, Yu-cheng ;Qiu, Zhi-hui ;Liu, Hong-zhong


Book ID
107378137
Publisher
Higher Education Press and Springer
Year
2006
Tongue
English
Weight
489 KB
Volume
1
Category
Article
ISSN
1673-3479

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Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV-based nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative