𝔖 Bobbio Scriptorium
✦   LIBER   ✦

A Moiré method for high accuracy alignment in nanoimprint lithography

✍ Scribed by M. Mühlberger; I. Bergmair; W. Schwinger; M. Gmainer; R. Schöftner; T. Glinsner; Ch. Hasenfuß; K. Hingerl; M. Vogler; H. Schmidt; E.B. Kley

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
684 KB
Volume
84
Category
Article
ISSN
0167-9317

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✦ Synopsis

Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV-based nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative simplicity of the marker-design and the whole setup combined with the possibility of an upgrade of existing equipment and still ultra-high precision alignment capabilities.

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