๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

A resist for electric imprint lithography

โœ Scribed by Yong Sik Ahn; Yong Chen; H. Thomas Hahn


Book ID
104052152
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
409 KB
Volume
86
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


European office for imprint lithography
๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 47 KB

## Compact universe Europe's academic research institutes are clearly impressed with Riber's Compact 21 MBE system. Designed for research and small-scale production, the system can grow single 2" or 3" wafers.

A nano-scale alignment method for imprin
โœ Wang, Li ;Lu, Bing-heng ;Ding, Yu-cheng ;Qiu, Zhi-hui ;Liu, Hong-zhong ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Higher Education Press and Springer ๐ŸŒ English โš– 489 KB
A photo-polymerization resist for UV nan
โœ Chun-Chang Wu; Steve Lien-Chung Hsu; Wen-Chang Liao ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 740 KB

A novel liquid photo-polymerization resist was prepared for nanoimprint lithography on transparent flexible plastic substrates. The resist is a mixture of polymethylmethacrylate (PMMA), methylmethacrylate (MMA), methacylic acid (MAA) and two photo-initiators, (2-isopropyl thioxanthone (ITX) and ethy

A novel positive resist for deep UV lith
โœ Tsuguo Yamaoka; Masashi Nishiki; Ken'Ichi Koseki; Mitsunobu Koshiba ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Society for Plastic Engineers ๐ŸŒ English โš– 208 KB
A negative resist for KrF excimer laser
โœ M. Toriumi; N. Hayashi; M. Hashimoto; S. Nonogaki; T. Ueno; T. Iwayanagi ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Society for Plastic Engineers ๐ŸŒ English โš– 545 KB