๐”– Bobbio Scriptorium
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A negative resist for KrF excimer laser lithography

โœ Scribed by M. Toriumi; N. Hayashi; M. Hashimoto; S. Nonogaki; T. Ueno; T. Iwayanagi


Publisher
Society for Plastic Engineers
Year
1989
Tongue
English
Weight
545 KB
Volume
29
Category
Article
ISSN
0032-3888

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โœ L.A. Wang; H.L. Chen ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 199 KB

Hexamethyldisiloxane (HMDSO) is used as coating material in a conventional ECR-PECVD process. By simply adjusting the gas flow rate ratio, the material can be varied to have suitable optical constants for making bottom antireflective coating (BARC) layers working at both 248 nm and 193 nm wavelength