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Novel positive deep UV resist for KrF excimer laser lithography

✍ Scribed by Masayuki Endo; Yoshiyuki Tani; Masaru Sasago; Kazufumi Ogawa; Noboru Nomura

Publisher: Society for Plastic Engineers
Year: 1989
Tongue: English
Weight: 347 KB
Volume: 29
Category: Article
ISSN: 0032-3888
DOI: 10.1002/pen.760291306

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