✦ LIBER ✦

Cyclophosphazene-containing Polymers as Imprint Lithography Resists

✍ Scribed by Erik C. Hagberg; Mark W. Hart; Lianhui Cong; Christopher W. Allen; Kenneth R. Carter

Book ID: 106416853
Publisher: Springer
Year: 2007
Tongue: English
Weight: 334 KB
Volume: 17
Category: Article
ISSN: 1053-0495
DOI: 10.1007/s10904-007-9130-7

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Relationship between electron sensitivit

Relationship between electron sensitivity and chemical structures of polymers as electron beam (EB) resists. V: Polyamides containing sulfur groups as positive eb resists

✍ Kiyoshi Oguchi; Sachiko Ygneyama; Kohei Sanul; Naoya Ogata; Yoichi Takahashi; To 📂 Article 📅 1988 🏛 Society for Plastic Engineers 🌐 English ⚖ 480 KB

New Hybrid Inorganic—Organic Polymers as

New Hybrid Inorganic—Organic Polymers as Supports for Heterogeneous Catalysis: A Novel Pd(0) Metalated Cyclophosphazene-Containing Polymer as an Efficient Heterogeneous Catalyst for the Heck Reaction.

✍ Vadapalli Chandrasekhar; Arunachalampillai Athimoolam 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 29 KB

## Abstract For Abstract see ChemInform Abstract in Full Text.

Relationship between electron sensitivit

Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3-dioxolan groups

✍ Kiyoshi Oguchi; Kohei Sanui; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada 📂 Article 📅 1990 🏛 Society for Plastic Engineers 🌐 English ⚖ 365 KB

## Abstract Vinyl polymers containing pendant acetal groups were synthesized using (2,2‐dimethyl‐l,3‐dioxolan‐4‐yl)methyl acrylate (DMA) and (2,2‐dimethyl‐l,3‐dioxo‐lan‐4‐yl)methyl methacrylate (DMM), and were evaluated as negative electron beam (EB) resists. It was found that the EB sensitivity of