𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3-dioxolan groups

✍ Scribed by Kiyoshi Oguchi; Kohei Sanui; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada

Publisher
Society for Plastic Engineers
Year
1990
Tongue
English
Weight
365 KB
Volume
30
Category
Article
ISSN
0032-3888

No coin nor oath required. For personal study only.

✦ Synopsis

Abstract

Vinyl polymers containing pendant acetal groups were synthesized using (2,2‐dimethyl‐l,3‐dioxolan‐4‐yl)methyl acrylate (DMA) and (2,2‐dimethyl‐l,3‐dioxo‐lan‐4‐yl)methyl methacrylate (DMM), and were evaluated as negative electron beam (EB) resists. It was found that the EB sensitivity of polymers containing acetal groups in the side chain was higher than that of polymers containing acetal groups in the main chain. A high sensitivity of 3.6 Γ— 10^βˆ’8^ C/cm^2^ was observed. Copolymers of DMA or DMM with styrene were also synthesized in order to improve the durability for dry etching process. It was found that the copolymers had an excellent dry etching durability and were adaptable to EB lithography.

πŸ“œ SIMILAR VOLUMES

Relationship between electron sensitivit
Relationship between electron sensitivity and chemical structure of polymers as EB resists. I. Electron sensitivity of various polyamides
✍ Naoya Ogata; Kohei Sanui; Chiaki Azuma; Hozumi Tanaka; Kiyoshi Oguchi; Tomihiro πŸ“‚ Article πŸ“… 1983 πŸ› John Wiley and Sons 🌐 English βš– 693 KB

## Abstract Polyamides containing double bonds or epoxy groups were synthesized and evaluated as electron beam (EB) resists, in order to find the relationship between electron beam sensitivity and chemical structure of the polyamides. It was found that polyamides containing double bonds, which have