Relationship between electron sensitivit
โ
Naoya Ogata; Kohei Sanui; Chiaki Azuma; Hozumi Tanaka; Kiyoshi Oguchi; Tomihiro
๐
Article
๐
1983
๐
John Wiley and Sons
๐
English
โ 693 KB
## Abstract Polyamides containing double bonds or epoxy groups were synthesized and evaluated as electron beam (EB) resists, in order to find the relationship between electron beam sensitivity and chemical structure of the polyamides. It was found that polyamides containing double bonds, which have