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Relationship between electron sensitivity and chemical structures of polymers as EB resists. III. Electron sensitivity of various polyamides using 3-amino perhydroazepine

โœ Scribed by Kiyoshi Oguchi; Kohei Sanui; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada


Publisher
John Wiley and Sons
Year
1984
Tongue
English
Weight
625 KB
Volume
29
Category
Article
ISSN
0021-8995

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๐Ÿ“œ SIMILAR VOLUMES


Relationship between electron sensitivit
โœ Naoya Ogata; Kohei Sanui; Chiaki Azuma; Hozumi Tanaka; Kiyoshi Oguchi; Tomihiro ๐Ÿ“‚ Article ๐Ÿ“… 1983 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 693 KB

## Abstract Polyamides containing double bonds or epoxy groups were synthesized and evaluated as electron beam (EB) resists, in order to find the relationship between electron beam sensitivity and chemical structure of the polyamides. It was found that polyamides containing double bonds, which have