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Relationship between electron sensitivity and chemical structures of polymers as electron beam (EB) resists. V: Polyamides containing sulfur groups as positive eb resists

✍ Scribed by Kiyoshi Oguchi; Sachiko Ygneyama; Kohei Sanul; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada

Publisher
Society for Plastic Engineers
Year
1988
Tongue
English
Weight
480 KB
Volume
28
Category
Article
ISSN
0032-3888

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Relationship between electron sensitivit
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