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Relationship between electron sensitivity and chemical structures of polymers as EB resists: Poly(lactam thioether) as new positive EB resists

✍ Scribed by Kiyoshi Oguchi; Sachiko Yoneyama; Kohei Sanui; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada


Publisher
Society for Plastic Engineers
Year
1986
Tongue
English
Weight
666 KB
Volume
26
Category
Article
ISSN
0032-3888

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πŸ“œ SIMILAR VOLUMES


Relationship between electron sensitivit
✍ Naoya Ogata; Kohei Sanui; Chiaki Azuma; Hozumi Tanaka; Kiyoshi Oguchi; Tomihiro πŸ“‚ Article πŸ“… 1983 πŸ› John Wiley and Sons 🌐 English βš– 693 KB

## Abstract Polyamides containing double bonds or epoxy groups were synthesized and evaluated as electron beam (EB) resists, in order to find the relationship between electron beam sensitivity and chemical structure of the polyamides. It was found that polyamides containing double bonds, which have

Relationship between electron sensitivit
✍ Kiyoshi Oguchi; Kohei Sanui; Naoya Ogata; Yoichi Takahashi; Tomihiro Nakada πŸ“‚ Article πŸ“… 1990 πŸ› Society for Plastic Engineers 🌐 English βš– 365 KB

## Abstract Vinyl polymers containing pendant acetal groups were synthesized using (2,2‐dimethyl‐l,3‐dioxolan‐4‐yl)methyl acrylate (DMA) and (2,2‐dimethyl‐l,3‐dioxo‐lan‐4‐yl)methyl methacrylate (DMM), and were evaluated as negative electron beam (EB) resists. It was found that the EB sensitivity of