✦ LIBER ✦
A novel overlay process for imprint lithography using load release and alignment error pre-compensation method
✍ Scribed by Jinyou Shao; Yucheng Ding; Yiping Tang; Hongzhong Liu; Bingheng Lu; Dongyin Cui
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 516 KB
- Volume
- 85
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.