𝔖 Bobbio Scriptorium
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Full wafer scale near zero residual nano-imprinting lithography using UV curable monomer solution

✍ Scribed by Heon Lee; Gun-Young Jung


Book ID
104050242
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
475 KB
Volume
77
Category
Article
ISSN
0167-9317

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