A comparative study of the electrical properties of TiO 2 films grown by high-pressure reactive sputtering and atomic layer deposition

✍ Scribed by Dueñas, S; Castán, H; García, H; Andrés, E San; Toledano-Luque, M; Mártil, I; González-Díaz, G; Kukli, K; Uustare, T; Aarik, J

• Book ID: 120354853
• Publisher: Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 687 KB
• Volume: 20
• Category: Article
• ISSN: 0268-1242
• DOI: 10.1088/0268-1242/20/10/011