A simplified method of creating multilevel imprint molds with sub-100 nm dimensions has been developed. The silicon nitride (Si x N y ) molds are patterned in a negative tone resist using single write electron beam lithography process, where the feature height is controlled by the exposure dosage. T
✦ LIBER ✦
3D materials made of gold using Nanoimprint Lithography
✍ Scribed by Iris Bergmair; Michael Mühlberger; Kurt Hingerl; Ekaterina Pshenay-Severin; Thomas Pertsch; Ernst Bernhard Kley; Holger Schmidt; Rainer Schöftner
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 448 KB
- Volume
- 87
- Category
- Article
- ISSN
- 0167-9317
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