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Design of Patterned Surfaces with Selective Wetting Using Nanoimprint Lithography

✍ Scribed by Aleksander Bessonov; Jeong-Gil Kim; Jung-Woo Seo; Jong-Woo Lee; Sukwon Lee

Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
487 KB
Volume
211
Category
Article
ISSN
1022-1352

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✦ Synopsis

Abstract

The fabrication of flexible surfaces with a combination of ultrahydrophobic and hydrophilic properties at alternating locations by UV NIL is reported. A new method for master fabrication based on nanoimprinting combined with photolithography is described. The master is used for a double replica technique to imprint nanopillars atop microstripes on a plastic substrate. Selective wetting is achieved due to ultrahydrophobic nanopatterned regions with 126Β° WCA and hydrophilic flat regions with 70Β° WCA on a single surface. By covering surface with hydrophobic SAM, a static contact angle of nanopillars is increased up to 163Β° indicating superhydrophobicity. We also show that the Cassie‐Wenzel theory successfully predicts the experimental apparent contact angles. magnified image

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Sub-100 nm V-grooves in GaAs(001) surfaces have been fabricated by patterning a thin photoresist layer with an atomic force microscope (AFM) and subsequent wet-chemical etching. The nanolithography is based on the dynamic ploughing technique. Anisotropic etchants under investigation are bromine-meth