Zn-vapor diffused Er:Yb:LiNbO3 channel waveguides fabricated by means of SiO2 electron cyclotron resonance plasma deposition

✍ Scribed by P.L Pernas; M.J Hernández; E Ruı́z; E Cantelar; R Nevado; C Morant; G Lifante; F Cussó

• Book ID: 104309170
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 260 KB
• Volume: 161
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/s0169-4332(00)00147-1

✦ Synopsis

We report here the fabrication method and operation of Zinc-vapor diffused channel waveguides on ErbiumrYtterbium Ž . Ž . Ž . ErrYb -doped Lithium Niobate LiNbO . electron cyclotron resonance ECR plasma deposition technique, UV pho-3 Ž . tolithography and Reactive Ion Etching RIE are used to define an SiO mask for pattern transfer. The whole process is 2 performed at low temperatures eliminating typical LiO out-diffusion problems and achieving low surface damage. The 2 flexibility of the fabrication technology has been shown to be potentially applicable to integrated optics. EDAX Ž . measurements reveal good confinement and homogeneity of the diffused regions. Atomic Force Microscopy AFM surface characterization shows the swelling of the diffused areas, consistent with the topoepitaxial growth of a Zn Li Nb O layer.

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