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X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(0 0 1)

✍ Scribed by Th. Chiaramonte; E. Abramof; F. Fabreguette; M. Sacilotti; L.P. Cardoso


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
320 KB
Volume
253
Category
Article
ISSN
0169-4332

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Tin oxide (SnO 2 ) epitaxial thin films have been prepared on TiO 2 (0 0 1) substrates at different temperatures by metalorganic chemical vapor deposition (MOCVD) method. The obtained films were pure SnO 2 with the tetragonal rutile structure. An in-plane orientation relationship of (0 0 1) SnO 2 :(