Preparation and characterization of single crystalline SnO2 films deposited on TiO2 (0 0 1) by MOCVD

✍ Scribed by Caina Luan; Jin Ma; Zhen Zhu; Lingyi Kong; Qiaoqun Yu

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 322 KB
• Volume: 318
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/j.jcrysgro.2010.10.056

✦ Synopsis

Tin oxide (SnO 2 ) epitaxial thin films have been prepared on TiO 2 (0 0 1) substrates at different temperatures by metalorganic chemical vapor deposition (MOCVD) method. The obtained films were pure SnO 2 with the tetragonal rutile structure. An in-plane orientation relationship of (0 0 1) SnO 2 :(0 0 1) TiO 2 with [1 0 0] SnO 2 :[1 0 0] and [0 1 0]SnO 2 :[0 1 0]TiO 2 between the film and substrate was determined. The SnO 2 film prepared at 600 1C presented the best single crystalline structure. The average transmittance of the SnO 2 samples in the visible range exceeded 68%. In the photoluminescence spectra, a broad luminescence band centered at 615 nm was observed.