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High resolution X-ray diffraction of GaN grown on Si (1 1 1) by MOVPE

โœ Scribed by N. Chaaben; T. Boufaden; A. Fouzri; M.S. Bergaoui; B. El Jani


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
643 KB
Volume
253
Category
Article
ISSN
0169-4332

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GaN grown on Si(1 1 1) with st
โœ C.C. Huang; S.J. Chang; R.W. Chuang; J.C. Lin; Y.C. Cheng; W.J. Lin ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 801 KB

The authors report the growth of crack-free GaN on Si(1 1 1) substrate with step-graded AlGaN intermediate layers all grown at 1120 โ€ข C. By preparing all these layers at high-temperature, we can simplify the growth proceduce and minimize the growth time. Using X-ray diffraction and transmission elec