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Vapour deposited boron nitride thin films

โœ Scribed by M.Z. Karim; D.C. Cameron; M.S.J. Hashmi

Publisher
Elsevier Science
Year
1992
Weight
1003 KB
Volume
13
Category
Article
ISSN
0261-3069

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โœ Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 987 KB

We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun