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Vanadium oxide thin films deposited on silicon dioxide buffer layers by magnetron sputtering

โœ Scribed by Sihai Chen; Hong Ma; Shuangbao Wang; Nan Shen; Jing Xiao; Hao Zhou; Xiaomei Zhao; Yi Li; Xinjian Yi


Book ID
108288972
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
182 KB
Volume
497
Category
Article
ISSN
0040-6090

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Characteristics of vanadium dioxide film
โœ Sun Jin Yun; Jung Wook Lim; Byung-Gyu Chae; Bong Jun Kim; Hyun-Tak Kim ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 145 KB

Vanadium dioxide films were deposited using reactive RF-magnetron sputter deposition technique and characterized without or with post-annealing process for the application of thermal sensors. The film thickness variation on a 4-in wafer was less than 72%. As-deposited film showing an abrupt metal-in