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UV nanoimprint lithography with rigid polymer molds

✍ Scribed by Sandra Gilles; Matthias Meier; Michael Prömpers; Andre van der Hart; Carsten Kügeler; Andreas Offenhäusser; Dirk Mayer

Book ID
104052196
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
447 KB
Volume
86
Category
Article
ISSN
0167-9317

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In nanoimprint lithography, the most common approach to prevent resist to adhere to the mold is to graft a fluorinated anti-sticking layer on the mold's surface. But it is known that these layers suffer from degradation after a certain number of imprints. In this work, we study the influence of the