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Use of a neural network to characterize the charge density of PECVD-silicon nitride films

โœ Scribed by Byungwhan Kim; Sang Hee Kwon


Book ID
105696911
Publisher
TechnoPress
Year
2007
Tongue
English
Weight
274 KB
Volume
13
Category
Article
ISSN
1598-9623

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Use of neural network method to characte
โœ Byungwhan Kim; Su Yeon Kim ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 795 KB

A prediction model of charge density of silicon nitride (SiN) films was constructed by using a generalized regression neural network (GRNN). The SiN film was deposited by a plasma enhanced chemical vapor deposition (PECVD) system and the deposition process was characterized by means of a statistical