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Use of neural network to model the deposition rate of PECVD-silicon nitride films

✍ Scribed by Kim, Byungwhan; Park, Kyungyoung; Lee, Dukwoo

Book ID: 111895318
Publisher: Institute of Physics
Year: 2005
Tongue: English
Weight: 188 KB
Volume: 14
Category: Article
ISSN: 0963-0252
DOI: 10.1088/0963-0252/14/1/011

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