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Modeling refraction characteristics of silicon nitride film deposited in a SiH4-NH3-N2 plasma using neural network

✍ Scribed by Byungwhan Kim; Seung-Soo Han; Tae Seon Kim; Bum Soo Kim; Il Joo Shim

Book ID: 114667000
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 628 KB
Volume: 31
Category: Article
ISSN: 0093-3813
DOI: 10.1109/tps.2003.812348

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