✦ LIBER ✦
7216. Oxidation kinetics of plasma-enhanced chemical deposition silicon nitride films deposited SiH4/NH3/NF3/N2 mixtures: C Gómez-Aleixandre et al,J Vac Sci Technol, A8, 1990, 540–543
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 144 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
No coin nor oath required. For personal study only.