✦ LIBER ✦

N, NH, and NH[sub 2] radical densities in a remote ArâNH[sub 3]âSiH[sub 4] plasma and their role in silicon nitride deposition

✍ Scribed by van den Oever, P. J.; van Helden, J. H.; van Hemmen, J. L.; Engeln, R.; Schram, D. C.; van de Sanden, M. C. M.; Kessels, W. M. M.

Book ID: 120990604
Publisher: American Institute of Physics
Year: 2006
Tongue: English
Weight: 888 KB
Volume: 100
Category: Article
ISSN: 0021-8979
DOI: 10.1063/1.2358330

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Density and production of NH and NH[sub

Density and production of NH and NH[sub 2] in an ArâNH[sub 3] expanding plasma jet

✍ van den Oever, P. J.; van Helden, J. H.; Lamers, C. C. H.; Engeln, R.; Schram, D 📂 Article 📅 2005 🏛 American Institute of Physics 🌐 English ⚖ 545 KB

N, NH, and NH[sub 2] radical densities in a remote ArâNH[sub 3]âSiH[sub 4] plasma and their role in silicon nitride deposition

N, NH, and NH[sub 2] radical densities in a remote ArâNH[sub 3]âSiH[sub 4] plasma and their role in silicon nitride deposition