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Ultrathin SiO2 film growth on Si by highly concentrated ozone

โœ Scribed by S Ichimura; A Kurokawa; K Nakamura; H Itoh; H Nonaka; K Koike


Book ID
114085301
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
273 KB
Volume
377-378
Category
Article
ISSN
0040-6090

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