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Tunneling Effective Mass of Electrons in Lightly N-Doped Gate Insulators

✍ Scribed by Nadimi, E.; Golz, C.; Trentzsch, M.; Herrmann, L.; Wieczorek, K.; Radehaus, C.


Book ID
114619523
Publisher
IEEE
Year
2008
Tongue
English
Weight
853 KB
Volume
55
Category
Article
ISSN
0018-9383

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There has been a search for alternative dielectrics with significantly increased dielectric constants, K, which increases physical thickness in proportion to K, and therefore would significantly reduce direct tunneling. However, increases in K to values of 15-25 in transition metal and rare earth ox