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Trends of structural and electrical properties in atomic layer deposited HfO2 films

✍ Scribed by G Scarel; S Spiga; C Wiemer; G Tallarida; S Ferrari; M Fanciulli


Book ID
108215006
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
235 KB
Volume
109
Category
Article
ISSN
0921-5107

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