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Trench etching using a CBrF3 plasma and its study by optical emission spectroscopy

✍ Scribed by G Wöhl; A Weisheit; I Flohr; M Böttcher

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 505 KB
Volume: 42
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(91)90556-x

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