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Characterization of a Trench Etching Process Using CBrF3 and Optimal Emission Spectroscopy of the Plasma

✍ Scribed by Dipl.-Phys G. Wöhl; Dr. S. Haščik

Publisher: John Wiley and Sons
Year: 1991
Tongue: English
Weight: 593 KB
Volume: 26
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.2170260610

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