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Transient enhanced diffusion and deactivation of ion-implanted As in strained Si

✍ Scribed by G.D.M. Dilliway; A.J. Smith; J.J. Hamilton; J. Benson; Lu Xu; P.J. McNally; G. Cooke; H. Kheyrandish; N.E.B. Cowern

No coin nor oath required. For personal study only.

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