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Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures

✍ Scribed by T Ishida; S Irieda; T Inada; N Sugii

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 226 KB
Volume: 224
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2003.08.045

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