✦ LIBER ✦
Transient enhanced diffusion of ion-implanted boron in Si during rapid thermal annealing: Masayasu Miyake and Shinji Aoyama, J appl Phys, 63, 1988, 1754–1757
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 149 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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