Ti-silicide formation during isochronal
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T. Stark; L. Gutowski; M. Herden; H. Grรผnleitner; S. Kรถhler; M. Hundhausen; L. L
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Article
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2001
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Elsevier Science
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English
โ 814 KB
Single-wavelength ellipsometry is employed to monitor in situ the reaction of titanium layers of different thickness (10-80 nm) with Si(100) to form titanium silicides during heating at constant rates up to 100 K / min. Previous studies performed on the platinum / silicon system showed that by the u