Erratum: “Silicide formation in the Ta/Ti/Si system by reaction of codeposited Ta and Ti with Si (100) and Si (111) substrates” [J. Appl. Phys. 85, 1531 (1999)]

✍ Scribed by Pelleg, Joshua; Goldshleger, N.

• Book ID: 120263151
• Publisher: American Institute of Physics
• Year: 2000
• Tongue: English
• Weight: 252 KB
• Volume: 87
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.372059