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In situ X-ray diffraction measurements of silicide formation in the CoSi system

✍ Scribed by S Zalkind; Joshua Pellag; L Zevin; B.M Ditchek


Book ID
107864625
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
690 KB
Volume
249
Category
Article
ISSN
0040-6090

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📜 SIMILAR VOLUMES


In situ study of the formation of silici
✍ C. Van Bockstael; K. De Keyser; J. Demeulemeester; A. Vantomme; R.L. Van Meirhae 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 425 KB

We investigate Co silicide phase formation when extra Si is added within an as deposited 50 nm Co film. The addition of Si is investigated for both the Co/SiO 2 and Co/Si(1 0 0) system. A series of 10 Co-Si mixed films with a Si content varying from 21 to 59 at.% was prepared and investigated during