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Titanium Diboride Thin Films by Low-Temperature Chemical Vapor Deposition from the Single Source Precursor Ti(BH 4 ) 3 (1,2-dimethoxyethane)

✍ Scribed by Kumar, Navneet; Yang, Yu; Noh, Wontae; Girolami, Gregory S.; Abelson, John R.

No coin nor oath required. For personal study only.

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