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Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S 2 CNMeHex) 3 , by Low-Pressure Metal−Organic Chemical Vapor Deposition

✍ Scribed by Lazell, Mike R.; O'Brien, Paul; Otway, David J.; Park, Jin-Ho

No coin nor oath required. For personal study only.

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