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Thin silicon films deposited at low substrate temperatures studied by surface photovoltage technique

✍ Scribed by K. Luterová; V. Švrček; T. Mates; M. Ledinský; M. Ito; A. Fejfar; J. Kočka

Book ID: 113936480
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 364 KB
Volume: 451-452
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2003.10.113

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## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al