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Deposition of thin films of copper on silicon substrates at low temperature by the ICB method

✍ Scribed by Marek Sosnowski; Isao Yamada

Book ID: 113279786
Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 377 KB
Volume: 37-38
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(89)90318-2

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